Multi-Color Patterning
Minimizes Edge Placement Error

 

Multi-color patterning is a materials-based approach that minimizes EPE, which is the undesirable movement of an edge in any direction,
resulting in shorts, opens and reduced reliability. Contributors are lithography overlay misalignment and process variation processes at the 10nm node and beyond.

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7nm-aligned_full.png
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7nm-misaligned_full.png
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7nm-multicolor_full.png
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6 MB
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7nm-multi_misaligned_full.png
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