Applied^™ Picosun^™ Morpher^™ T

Applied^™ Picosun^™ Morpher^™ T single wafer ALD system is designed to answer the requirements when quality, control and yield come before anything else, for the up to 200 mm wafer industries.  It also enables an enhanced process window for demanding production of MEMS, sensors, LEDs, lasers, power electronics, optics, and 5G components with the leading process quality, reliability, and operational agility.

Applied Picosun Morpher T offers fully automated handling of wafers and an industry-standard single-wafer vacuum cluster platform. It can also be combined with Applied^™ Morpher^™ Batch ALD, thermal batch wafer process module, or with Applied^™ Picosun^™ Morpher^™ P, plasma enhanced single wafer ALD process module. The state-of-the-art reaction chamber design enables a wide process library even for demanding processes and demanding applications, without deposition on the backside of the substrate for easy process flow integration. The compact, ergonomic design with easy and fast maintenance ensures minimum system downtime and low cost of ownership.