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Pitchwalking refers to pitch variation between features; it can degrade performance, power efficiency, or signal integrity. It is caused by inconsistency in feature critical dimension from process variation and mitigated by optimizing deposition and etch for spacer and mandrel uniformity.
Pitchwalking refers to pitch variation between features; it can degrade performance, power efficiency, or signal integrity. It is caused by inconsistency in feature critical dimension from process variation and mitigated by optimizing deposition and etch for spacer and mandrel uniformity.