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Dielectric deposition involves creating a layer of material with insulating properties that is deposited onto a substrate or surface. The dielectric film acts as an electrical insulator and is used in numerous types of electronic devices. Applied Materials offers a comprehensive product portfolio of dielectric films encompassing a wide range of materials, including oxides, nitrides, and silicon. Other applications include patterning films to create shapes and structures, insulation materials between the layers of conducting metals and strain engineering that uses compressive or tensile stress films to enhance transistor performance through improved mobility. The dielectric films are deposited using CVD (chemical vapor deposition) process. The thickness of the dielectric film can vary depending on the desired electrical properties and specific device requirements.