Vantage^® RadOx^™ RTP

Advanced device scaling requires thinner, higher quality oxides with low leakage and high reliability, reduced thermal budgets, and tighter process control. With its radical oxidation chemistry, the Applied Vantage RadOx RTP grows a high-density, high-quality oxide in low thermal budgets.

The system's innovative technology breaks through the scaling barriers for critical oxidation steps like memory gate oxide, shallow trench isolation liner oxide, sacrificial oxide, sidewall oxide, flash tunnel oxide, and ONO stack. With tight thermal budget control and in-process monitoring, RadOx continues to deliver superior-quality oxide in the industry-leading Radiance chamber on the high-productivity, production-proven Vantage platform.