Producer^® Eterna^® FCVD^™

With the Eterna FCVD system, Applied continues its decade-long leadership in delivering gap-fill technology advances to the semiconductor industry. These innovations have provided customers with unique, simplified, and cost effective solutions to meet the challenges of multiple chip generations.

Chip manufacturers are continuously designing chips with smaller and smaller transistors to gain more functionality per square millimeter. As the transistors shrink, so do the spaces between them, making it increasingly difficult to physically isolate them from one another. Filling the tiny and often irregularly shaped spaces (gaps) between transistors with a high‑quality dielectric is becoming increasingly challenging and a new solution is required for chip designs for 20nm and below.