Vantage^® Radiance^® Plus RTP

The Applied Vantage Radiance Plus RTP system is the industry-leading, high-productivity solution for high-volume, atmospheric RTP applications, combining world-class RTP chamber technology with a production-proven, low cost-of-ownership platform. Its streamlined design allows for shipment as a single unit, enabling faster start-up and shorter time to production.

The system leverages established Radiance chamber technology: honeycomb lamp source, seven-point temperature measurement, 100 Hz closed-loop control, and 240 rpm wafer rotation. Its optimized hardware and temperature control delivers unsurpassed spike anneal uniformity for implant and other anneals. The temperature window is very wide, encompassing low-temperature, e.g., silicide, anneals to ultra-high-temperature, e.g., wafer, anneal.