Applied^® SigmaMeltec^® CTS Mask Coat Series

Achieving world class photomask CD uniformity begins with the quality of resist coating. At the nanometer scale many subtle factors become important, including the purity, temperature and humidity of the chamber air, the pre-treatment of the mask surface, the resist dispense and spinning characteristics, and control of the post apply bake profile.

Sigmameltec’s CTS system provides a controlled environment supporting the production of high quality resist layers with repeatable characteristics and ultra-low defect levels. Pre-treatment of mask blanks ensures pristine surfaces with good adhesion and tightly controlled resist dispense and spin programs deliver coating uniformity on the order of 1 nm (3s). The coating chamber includes dispense arms for three resist types, with the option for additional arms. And an automated solvent rinse ensures consistent cleanliness of the coating environment.