Applied SEMVision G3 STAR Defect Analysis system is the production-proven workhorse for inline defect review and analysis for the 65nm era. Continuing the productivity leadership of the SEMVision product line, G3 STAR delivers high throughput, extreme sensitivity and automated calibrations, offering the most advanced capabilities for production and engineering applications. Field proven applications such as High Aspect Ratio imaging, tilt imaging and material analysis provide customers the ability to control defects and processes with greater success, leading to higher yields and faster time to market.

Over the last several years, rapid expansion of in-line SEM review in fabs worldwide created the need for new review strategies. The SEMVision G3 STAR family is a direct response to customer needs for a set of leading-edge tools optimized for different applications, enabling flexible system utilization during all stages of production ramp at the lowest overall cost.

All three systems in the Applied SEMVision family – G3 STAR, G3 HP STAR and G3 FIB STAR – share a single platform, a common user interface and shared recipes. This unique commonality shortens set-up time through extensive recipe sharing, and provides higher availability and WIP control. Using a common platform also lowers operating expenses by sharing spares, service contracts and operating knowledge.

The SEMVision G3 STAR family is part of Applied Materials' Resolution strategy to lead the metrology and inspection market with continuous advances in absolute resolution, root cause, process response and cost per resolution.