The Applied Reflexion LK Fixed-Abrasive Web CMP system provides slurry-less next-generation planarization for shallow trench isolation (STI) applications, delivering unsurpassed metrics for trench oxide and nitride within-die thickness range and effectively eliminating trench oxide dishing and nitride erosion. The Fixed-Abrasive Web’s unique capabilities enable exceptional wafer-to-wafer repeatability by ensuring that each wafer sees exactly the same conditions on the platen.