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		Etch Press Releases All Etch Products 06/02/2005 Applied Materials' Etch Market Share Jumps in 2004 05/17/2005 Applied Materials Achieves Major Market Share Gains in 2004 Conductor Etch 07/17/2007 Applied Materials' New Carina System Overcomes Barriers to Etching High-k/Metal Gates 07/17/2007 Applied Materials Makes the Transistor Cool Again with Integrated High-k/Metal Gate Technology 04/03/2007 Applied Materials Delivers Record Trench Depths with New Mariana Etch System 12/05/2006 Applied Materials' New Opus AdvantEdge System Maximizes Flash and DRAM Etch Productivity 03/28/2006 Applied Materials' AdvantEdge Etch System Selected for Advanced Memory Production 12/06/2005 Applied Materials Delivers Advanced Solutions for Flash Memory Chip Manufacturing 12/06/2005 Applied Materials Introduces AdvantEdge Metal Etch System for Advanced Flash, DRAM Chips 07/12/2005 Applied Materials' New AdvantEdge Etch Cuts Transistor CD Variation by 50% to Wafer's Edge Dielectric Etch 07/14/2008 Applied Materials’ Producer System Delivers Highest Productivity Etch for Advanced Memory Interconnects  07/07/2005 Applied Materials' Enabler Etch System Named Best Product by Semiconductor International Magazine Mask Etch 04/17/2007 Applied Materials Delivers Critical 45nm Photomask Etch Technology with New Tetra III System 06/05/2006 Hoya Selects Applied Materials' Tetra Mask Etcher for 65nm Production